Author:
Verduin T.,Kruit P.,Hagen C. W.
Reference14 articles.
1. Characterization of line-edge roughness in resist patterns and estimations of its effect on device performance;Yamaguchi,2003
2. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance;Lee,2004
3. Impact of line width roughness on the matching performances of next-generation devices
4. Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images
5. Bias-Free Measurement of LER/LWR with Low Damage by CD-SEM;Yamaguchi,2006
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