Allowable SEM noise for unbiased LER measurement
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SPIE
Reference14 articles.
1. ITRS, The International Technology Roadmap for Semiconductors (ITRS). 2013.
2. Mack, C.A. and B.D. Bunday. Analytical linescan model for SEM metrology. Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240F (19 March 2015); doi: 10.1117/12.2086119.
3. Verduin, T., P. Kruit, and C.W. Hagen. Determination of line edge roughness in low dose top-down scanning electron microscopy images. Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90500L (2 April 2014); doi: 10.1117/12.2046493.
4. Constantoudis, V., V.K. Murugesan Kuppuswamy, and E. Gogolides. Noise effects on contact edge roughness and CD uniformity measurement. Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83240K (5 April 2012); doi: 10.1117/12.918014.
5. Systematic errors in the measurement of power spectral density
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