An optimized parameter guidance system for line/space CD metrology

Author:

Zhao Nan,Pu Lingling,Wang Teng,Zhou Wentian,Xu Ming,Fang Wei,Lee Brian

Publisher

SPIE

Reference25 articles.

1. A simulation study of repeatability and bias in the CD-SEM;Villarrubia,2003

2. Robust edge detection with considering three-dimensional sidewall feature by CD-SEM;Yamaguchi,2011

3. Evaluation of CD-SEM measurement uncertainty using secondary electron simulation with charging effect;Abe,2007

4. The study of high-sensitive and accurate metrology method by using CD-SEM;Ueda,2012

5. March. Fast analytical modeling of SEM images at a high level of accuracy;Babin,2015

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. SEM image quality enhancement: an unsupervised deep learning approach;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

2. Analyze line roughness sources using power spectral density (PSD);Metrology, Inspection, and Process Control for Microlithography XXXIII;2019-03-26

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