1. Strategy for Minimizing EUV Optics Contamination During Exposure;Noreen,2008
2. A New Mask Exposure and Analysis Facility;te Sligte,2014
3. Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Hironobu Yabuta, Akihisa Nagano, Takahiro Shirai, Noritaka Ashizawa, Kiyotada Nakamura, Kunihiko Kasama, “High-radiance LDP source for mask-inspection application,” in Extreme Ultraviolet (EUV) Lithography VI, Proc. of SPIE Vol. 9422 (SPIE, San Jose, CA, March 2015), pp. 94220F-1-9.
4. SEMI E152-0214 - Mechanical Specification of EUV Pod for 150 mm EUVL Reticles
5. Andreas Mack, Jacques van der Donck, Olaf Kievit, “Numerical Modeling of Particle Transport in Rarefied Flow”, http://www2.avs.org/symposium2014/Papers/Paper_VT-TuM6.html