Development of standard samples with programmed defects for evaluation of pattern inspection tools for 7-nm and smaller nodes-Reference-Cited by-同舟云学术

Development of standard samples with programmed defects for evaluation of pattern inspection tools for 7-nm and smaller nodes

Published:2019-09-13 Issue:03 Volume:18 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Iida Susumu¹,Nagai Takamitsu¹,Uchiyama Takayuki¹

Affiliation:

1. Evolving Nano Process Infrastructure Development Center, Inc., Ibaraki-ken

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. Stochastic printing failures in extreme ultraviolet lithography

2. State-of-the-art of EUV materials for N5 logic and DRAM applications

3. Multi-beam SEM technology for ultra-high throughput

4. Investigation of defect detectability for extreme ultraviolet patterned mask using two types of high-throughput electron-beam inspection systems

5. Development of an electron optical system using EB projection optics in reflection mode for EB inspection

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