Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay-Reference-Cited by-同舟云学术

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Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay

Published:2019-06-17 Issue:02 Volume:18 Page:1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Starikov Alexander¹

Affiliation:

1. I&I Consulting, Palo Alto, California, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. Physical and technological limits in optical and x-ray lithography

2. Overlay Simulator For Wafer Steppers

3. Registration accuracy in submicron devices

4. Fast optical and process proximity correction algorithms for integrated circuit manufacturing;Cobb,1998

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. E-Test Validation of Space Error Budget and Metrology;IEEE Transactions on Semiconductor Manufacturing;2022-08

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