Author:
Arnold William H.,Lin Burn J.
Cited by
14 articles.
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1. Overlay and edge placement error metrology in the era of stochastics;Metrology, Inspection, and Process Control XXXVII;2023-04-27
2. Overlay stability control in IBO measurement using rAIM target;Metrology, Inspection, and Process Control XXXVI;2022-05-26
3. Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 4: Placement and Critical Dimension, Edge to Edge Overlay;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-06-17
4. Process window-based feature and die failure rate prediction;Design-Process-Technology Co-optimization for Manufacturability XIII;2019-03-20
5. Edge placement error fundamentals and impact of EUV: will traditional design-rule calculations work in the era of EUV?;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-09-24