Process window-based feature and die failure rate prediction-Reference-Cited by-同舟云学术

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Process window-based feature and die failure rate prediction

Published:2019-03-20 Issue: Volume: Page:
ISSN:
Container-title:Design-Process-Technology Co-optimization for Manufacturability XIII
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Author:

Sturtevant John L.,Yin Lianghong,Kim Young Chang,Shang Shumay,Burbine Andrew,Clifford Chris,Adam Kostas

Publisher

SPIE

Reference17 articles.

1. Projection Printing Characterization

2. The Exposure-Defocus Forest

3. Lithographic comparison of assist feature design strategies

4. Yield modeling and enhancement for optical lithography

5. New mask data verification method after optical proximity effect correction

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23

2. Real-time full-wafer design-based inter-layer virtual metrology;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

3. Stochastic model prediction of pattern-failure;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

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