Author:
Siebert J.,Brooker P.,Schmoeller T.,Klimpel T.
Cited by
3 articles.
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1. Self-aligned double-patterning layout decomposition for two-dimensional random metals for sub-10-nm node design;Journal of Micro/Nanolithography, MEMS, and MOEMS;2014-12-04
2. Split, overlap, stitching, and process design for double patterning considering local reflectivity variation by using rigorous three-dimensional wafer-topography and lithography simulation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-04-01
3. Calibration of physical resist models: methods, usability, and predictive power;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-07-01