Author:
Word James C.,Zhu Siuhua,Sturtevant John L.
Cited by
9 articles.
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1. Mitigating the forbidden pitch of extreme ultraviolet lithography using mask optimization based on genetic algorithm;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-20
2. Analysis and mitigation of forbidden pitch effects for EUV lithography;Extreme Ultraviolet Lithography 2020;2020-09-20
3. The impact of inconsistency in assist feature generation on OPC performance;Photomask Technology;2017-10-23
4. Challenges for patterning process models applied to large scale;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-05
5. Detailed Placement for Enhanced Control of Resist and Etch CDs;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2007-12