The impact of inconsistency in assist feature generation on OPC performance-Reference-Cited by-同舟云学术

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The impact of inconsistency in assist feature generation on OPC performance

Published:2017-10-23 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology
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Author:

Abdo Amr Y.,Viswanathan Ramya,Samuels Donald J.,Conklin David

Publisher

SPIE

Reference10 articles.

1. Resolution Enhancement Techniques in Optical Lithography

2. Assist Feature OPC Implementation for the 130 nm Technology Node with KrF and No Forbidden Pitches;Word,2002

3. Automatic SRAF printing detection based on contour extraction;Liang,2017

4. New Process Models for OPC at sub-90nm Nodes;Granik,2003

5. Calibration of OPC Models for Multiple Focus Conditions;Schacht,2004

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving ORC methods and hotspot detection with the usage of aerial image metrology;Optical Microlithography XXXIII;2020-03-23

2. Automatic SRAF printing detection based on contour extraction;Photomask Technology;2017-10-16

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