Author:
Cao Liang,Zhang Jie,Jiang Wenchao,Zhang Dong Qing,Wang Wei-long,Hou Jiechang
Reference8 articles.
1. Liang Cao, Abhishek Asthana, Guoxiang Ning, etc. Auto-score system to optimize OPC recipe parameters using genetic algorithm, Proc. SPIE 9985, Photomask Technology (2016)
2. ChangAn Wang, Norman Chen, Chidam Kallingal, William Wilkinson, Jian Liu, Alan Leslie, Using heuristic optimization to set SRAF rules, Proc. SPIE, 10147, (2017)
3. The impact of inconsistency in assist feature generation on OPC performance
4. Monte Carlo sensitivity analysis of EUV mask reflectivity and its impact on OPC accuracy;Chen;SPIE Advanced Lithography,2017
5. Kriti K. Kohli, Iona Graur, Mark Jobes, Automated detection and classification of printing sub-resolution assist features using machine learning algorithms, Proc. SPIE 10147, Optical Microlithography (2017)
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