Analysis and mitigation of forbidden pitch effects for EUV lithography

Author:

Ma Ling,Dong Lisong,Fan Taian,Su Xiaojing,He Jianfang,Wu Ruixuan,Zhou Yumei,Wei Yayi

Publisher

SPIE

Reference11 articles.

1. Extreme ultraviolet lithography: overview and development status;Peter;J. Microlith, Microfab, Microsyst,2005

2. Xiaofeng Liu, et al., “EUV source-mask optimization for 7 nm node and beyond,” Proc. SPIE 9048, 90480Q (2014).

3. Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability

4. Xuelong Shi, et al., “Understanding the Forbidden Pitch Phenomenon and Assist Feature Placement,” Proc. SPIE 4689(2002).

5. Forbidden Pitch or Duty-Free: Revealing the Causes of Across-Pitch Imaging Differences;Bruce,2003

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