Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability-Reference-Cited by-同舟云学术

Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability

Published:2015-11-23 Issue:4 Volume:14 Page:043507
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Guo Moran¹,Song Zhiyang¹,Feng Yaobin²,Tian Zhengguo²,Cao Qingchen²,Wei Yayi¹

Affiliation:

1. Chinese Academy of Sciences, Institute of Microelectronics, Laboratory of Microelectronics Devices and Integrated Technology, 3 Beitucheng West Road, Chaoyang, Beijing 100029, China

2. Xinxin Semiconductor Manufacturing Corporation, 18 Gaoxin 4TH Road, Wuhan, Hubei 430205, China

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. Full-flow RET creation, comparison, and selection

2. Hybrid source mask optimization for robust immersion lithography

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