Full-flow RET creation, comparison, and selection-Reference-Cited by-同舟云学术

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Full-flow RET creation, comparison, and selection

Published:2014-10-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Lafferty Neal,He Yuan,Silakov Mikhail,Endo Toshi,Adam Kostas

Publisher

SPIE

Reference6 articles.

1. Optimum mask and source patterns to print a given shape

2. An innovative source-mask co-optimization (SMO) method for extending low k1 imaging;Hsu,2008

3. Simultaneous source mask optimization (SMO);Socha,2005

4. Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process;Lai,2009

5. EUV source-mask optimization for 7nm node and beyond;Liu,2014

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A novel contrast-aware SMO at 7nm technology node;DTCO and Computational Patterning;2022-05-26

2. Retargeting of forbidden-dense-alternate structures for lithography capability improvement in advanced nodes;Applied Optics;2018-09-13

3. Efficient source mask optimization method for reduction of computational lithography cycles and enhancement of process-window predictability;Journal of Micro/Nanolithography, MEMS, and MOEMS;2015-11-23

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