Optimizing an EUV source for 13.5 nm-Reference-Cited by-同舟云学术

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Optimizing an EUV source for 13.5 nm

Published:2004-01-07 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

O'Sullivan Gerry D.,Cummings Anthony,Duffy Grainne,Dunne Padraig A.,Fitzpatrick Andrew,Hayden Paddy,McKinney Luke,Murphy Nicola,O'Reilly Dave,Sokell Emma J.,White John

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of laser-produced plasma sources for extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-29

2. Tin laser-produced plasma source modeling at 13.5nm for extreme ultraviolet lithography;Applied Physics Letters;2008-04-14

3. Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength;Applied Physics Letters;2007-04-30

4. Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source;Optics Letters;2007-04-17

5. Investigation of the interaction of a laser pulse with a preformed Gaussian Sn plume for an extreme ultraviolet lithography source;Journal of Applied Physics;2007-01-15

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