Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference16 articles.
1. Characterization of extreme ultraviolet emission from laser-produced spherical tin plasma generated with multiple laser beams
2. Dynamic imaging of 13.5 nm extreme ultraviolet emission from laser-produced Sn plasmas
3. Angular distribution control of extreme ultraviolet radiation from laser-produced plasma by manipulating the nanostructure of low-density SnO2 targets
4. Extreme-ultraviolet spectral purity and magnetic ion debris mitigation by use of low-density tin targets
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1. A laser-produced plasma source based on thin-film Gd targets for next-generation extreme ultraviolet lithography;Plasma Science and Technology;2023-06-27
2. Spectral dynamics of soft X-ray emission in dual-laser-produced medium-Z plasma;Applied Physics B;2018-09-05
3. Emission of water-window soft x-rays under optically thin conditions using low-density foam targets;Optics Letters;2018-07-31
4. Research on the Dynamics of Ion Debris from Sn Plasma by Use of Dual Laser Pulses;SPECTROSC SPECT ANAL;2015
5. Emission properties of tin droplets laser-produced-plasma light sources;SPIE Proceedings;2014-04-17
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