Carbon contamination topography analysis of EUV masks-Reference-Cited by-同舟云学术

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Carbon contamination topography analysis of EUV masks

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Fan Yu-Jen,Yankulin Leonid,Thomas Petros,Mbanaso Chimaobi,Antohe Alin,Garg Rashi,Wang Yunfei,Murray Thomas,Wüest Andrea,Goodwin Frank,Huh Sungmin,Cordes Aaron,Naulleau Patrick,Goldberg Kenneth,Mochi Iacopo,Gullikson Eric,Denbeaux Gregory

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering;Optics Express;2021-10-15

2. EUV-induced hydrogen plasma: pulsed mode operation and confinement in scanner;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-08-16

3. Study of EUV reticle storage effects through exposure on EBL2 and NXE;Extreme Ultraviolet Lithography 2020;2020-11-04

4. Predicting radiation-induced carbon contamination of EUV optics;Journal of Vacuum Science & Technology B;2019-03

5. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017

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