In-cell overlay metrology by using optical metrology tool-Reference-Cited by-同舟云学术

In-cell overlay metrology by using optical metrology tool

Published:2018-03-13 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control for Microlithography XXXII
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Author:

Park Hyowon,Lee Honggoo,Han Sangjun,Hong Minhyung,Kim Seungyoung,Lee Jieun,Lee Dongyoung,Oh Eungryong,Choi Ahlin,Lee Jeongpyo,Choi DongSub,Pandev Stilian,Kim Nakyoon,Jeon Sanghuck,Robinson John,Liang Waley

Publisher

SPIE

Reference5 articles.

1. Honggoo Lee, Sangjun Han, Jaeson Woo, DongYoung Lee, ChangRock Song, Hoyoung Heo, Irina Brinster, DongSub Choi, John C. Robinson, “High-volume manufacturing device overlay process control,” Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450D (28 March 2017).

2. Honggoo Lee, Sangjun Han, Youngsik Kim, Myoungsoo Kim, Hoyoung Heo, Sanghuck Jeon, DongSub Choi, Jeremy Nabeth, Irina Brinster, Bill Pierson, John C. Robinson, “Device overlay method for high volume manufacturing,” Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781F (18 March 2016).

3. John A. Allgair, David C. Benoit, Robert R. Hershey, Lloyd C. Litt, Ibrahim S. Abdulhalim, William Braymer, Michael Faeyrman, John Charles Robinson, Umar K. Whitney, Yiping Xu, Piotr Zalicki, Joel L. Seligson, “Manufacturing considerations for implementation of scatterometry for process monitoring”, Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000).

4. Stilian Pandev, Fang Fang, Young Ki Kim, Jamie Tsai, Alok Vaid, Lokesh Subramany, Dimitry Sanko, Vidya Ramanathan, Ren Zhou, Kartik Venkataraman, Ronny Haupt, “Signal response metrology (SRM): a new approach for lithography metrology,” Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241P (19 March 2015);

5. Fang Fang, Xiaoxiao Zhang, Alok Vaid, Stilian Pandev, Dimitry Sanko, Vidya Ramanathan, Kartik Venkataraman, Ronny Haupt, “Improving OCD time to solution using Signal Response Metrology,” Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977806 (24 March 2016);

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