<title>Manufacturing considerations for implementation of scatterometry for process monitoring

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Manufacturing considerations for implementation of scatterometry for process monitoring

Published:2000-06-02 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Allgair John A.,Benoit David C.,Hershey Robert R.,Litt Lloyd C.,Abdulhalim Ibrahim S.,Braymer William,Faeyrman Michael,Robinson John C.,Whitney Umar K.,Xu Yiping,Zalicki Piotr,Seligson Joel L.

Publisher

SPIE

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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3. Development of a tomographic Mueller-matrix scatterometer for nanostructure metrology;Review of Scientific Instruments;2018-07

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