Signal response metrology (SRM): a new approach for lithography metrology

Author:

Pandev Stilian,Fang Fang,Kim Young Ki,Tsai Jamie,Vaid Alok,Subramany Lokesh,Sanko Dimitry,Ramanathan Vidya,Zhou Ren,Venkataraman Kartik,Haupt Ronny

Publisher

SPIE

Reference6 articles.

1. Dose and focus estimation using top-down SEM images;Shishido,2003

2. Modeling for Profile-Based Process-Windows Metrology;Ausschnitt,2004

3. CDSEM Focus/Dose Monitor for Product Applications;Archie,2010

4. Lithography Focus/Exposure Control and Corrections to Improve CDU;Kim,2013

5. Scatterometry-based on-product focus measurement and monitoring;Hinnen,2013

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1. Mueller matrix spectroscopy and physics-based machine learning for gate-all-around sheet-specific metrology;Metrology, Inspection, and Process Control XXXVII;2023-04-27

2. Scatterometry and machine learning for in-die overlay solution;Metrology, Inspection, and Process Control XXXVII;2023-04-27

3. In-cell overlay metrology by using optical metrology tool;Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-13

4. SAQP pitch walk metrology using single target metrology;SPIE Proceedings;2017-03-28

5. Quantifying imaging performance bounds of extreme dipole illumination in high NA optical lithography;SPIE Proceedings;2016-10-03

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