EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond-Reference-Cited by-同舟云学术

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EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond

Published:2014-07-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Takekoshi Hidekazu,Nakayama Takahito,Saito Kenichi,Ando Hiroyoshi,Inoue Hideo,Nakayamada Noriaki,Kamikubo Takashi,Nishimura Rieko,Kojima Yoshinori,Yashima Jun,Anpo Akihito,Nakazawa Seiichi,Iijima Tomohiro,Ohtoshi Kenji,Anze Hirohito,Katsap Victor,Golladay Steven,Kendall Rodney

Publisher

SPIE

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recent progress and future of electron multi-beam mask writer;Japanese Journal of Applied Physics;2023-02-17

2. Direct correlation between mask registration and on-wafer measurements for individual logic device features;Photomask Technology 2022;2022-12-01

3. Relationship between blurring factors and interfacial effects in chemically amplified resist processes in photomask fabrication;Japanese Journal of Applied Physics;2021-12-01

4. Theoretical study of interfacial effects on low-energy electron dynamics in chemically amplified resist processes of photomask fabrication;Japanese Journal of Applied Physics;2021-08-01

5. Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning;Japanese Journal of Applied Physics;2021-07-01

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