1. Off-line mask-to-mask registration characterization as enabler for computational overlay;van Haren,2017
2. The mask contribution as part of the intra-field on-product overlay performance;van Haren,2020
3. In-die photomask registration and overlay metrology with PROVE® using 2D correlation methods;Seidel,2011
4. Registration performance on EUV masks using high-resolution registration metrology;Steinert,2016
5. EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond;Takekoshi,2014