Analysis of mitigating factors for line edge roughness generated during electron beam lithography using machine learning
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ac0d13/pdf
Reference32 articles.
1. Holistic lithography in the age of the Artificial Intelligence of Things
2. Today’s scorecard for tomorrow’s photoresist: progress and outlook towards High-NA EUV lithography
3. Resist Materials and Processes for Extreme Ultraviolet Lithography
4. High-NA EUV lithography exposure tool: key advantages and program progress
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