1. Correction for etch proximity: new models and applications;Granik,2001
2. Dry etch proximity modeling in mask fabrication;Granik,2003
3. Koji Sugano., “Reduction in surface roughness and aperture size effect for XeF2 etching of Si”, Proc. SPIE 4979, doi:10.1117/12. 473376
4. Sunwook, Jung., “Analysis of pattern density on process proximity compensation”, Proc. SPIE. 6520, doi: 10.1117/12.711841
5. Dry-etch proximity function for model-based OPC beyond 65nm node;Sato,2006