Si-photonics waveguides manufacturability using advanced RET solutions

Author:

Zeggaoui N.1,Orlando B.2,Kerrien G.2,Farys V.2,Yesilada E.2,Cremer S.2,Tritchkov A.3,Liubich V.3

Affiliation:

1. Mentor Graphics Corp. (France)

2. STMicroelectronics (France)

3. Mentor Graphics Corp. (United States)

Publisher

SPIE

Reference4 articles.

1. F. Boeuf et al. “A Multi-wavelength 3D-compatible Silicon Photonics Platform on 300mm SOI wafers for 25Gbits/s Applications”, 13.3.1-13.3.4, Proceedings IEDM 2013

2. Finding practical phenomenological models that include both photoresist behavior and etch process effects;Jung.,2015

3. Fast pixel-based mask optimization for inverse lithography

4. Extreme mask corrections: technology and benefits

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Mask synthesis for silicon photonics devices;Integrated Photonics Platforms II;2022-05-26

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