Fast pixel-based mask optimization for inverse lithography

Author:

Granik Yuri

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference32 articles.

1. OML: optical maskless lithography for economic design prototyping and small-volume production

2. S. I. Sayegh , “Image restoration and image design in non-linear optical systems,” PhD Thesis, Univ. of Wisconsin, Madison (1982).

3. Source optimization for image fidelity and throughput

4. K. Nashold , “Image synthesis—a means of producing superresolved binary images through bandlimited systems,” PhD Thesis, Univ. of Wisconsin, Madison (1987).

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