A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection-Reference-Cited by-同舟云学术

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A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Huh Sungmin,Ren Liping,Chan David,Wurm Stefan,Goldberg Kenneth,Mochi Iacopo,Nakajima Toshio,Kishimoto Masahiro,Ahn Byungsup,Kang Inyong,Park Joo-on,Cho Kyoungyong,Han Sang-in,Laursen Thomas

Publisher

SPIE

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. EUV multilayer defect characterization via cycle-consistent learning;Optics Express;2020-06-05

2. SEM AutoAnalysis for reduced turnaround time and to ensure repair quality of EUV photomasks;International Conference on Extreme Ultraviolet Lithography 2019;2019-09-26

3. Zernike phase contrast microscope for EUV mask inspection;SPIE Proceedings;2014-04-17

4. Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability;Japanese Journal of Applied Physics;2013-09-01

5. Defect management of EUV mask;SPIE Proceedings;2012-06-30

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