Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies

Author:

Davydova N.,Kottumakulal R.,Hageman J.,McNamara J.,Hoefnagels R.,Vaenkatesan V.,van Dijk A.,Ricken K.,de Winter L.,de Kruif R.,Jonckheere R.,Hollink T.,Schiffelers G.,van Setten E.,Colsters P.,Liebregts W.,Pellens R.,van Dijk J.

Publisher

SPIE

Reference8 articles.

1. Impact of an etched EUV mask black border on imaging and overlay;Davydova,2012

2. Impact of an etched EUV mask black border on imaging. Part II;Davydova,2013

3. Black Border, Mask 3D effects: covering challenges of EUV mask architecture for 22 nm node and beyond;Davydova,2014

4. Deep Ultraviolet Out-of-Band Contribution in Extreme Ultraviolet Lithography: Predictions and Experiments;Lorusso,2011

5. Deep ultraviolet out-of-band characterization of EUVL scanners and resists

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1. Development of an EUV and OoB Reflectometer at NewSUBARU synchrotron light facility;Photomask Technology 2019;2019-09-26

2. Physics of laser-driven tin plasma sources of EUV radiation for nanolithography;Plasma Sources Science and Technology;2019-08-01

3. EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection;Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology;2018-06-12

4. Ultraviolet out-of-band radiation studies in laser tin plasma sources;Journal of Applied Physics;2017-11-07

5. Novel EUV mask black border suppressing EUV and DUV OoB light reflection;SPIE Proceedings;2016-05-10

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