Ultraviolet out-of-band radiation studies in laser tin plasma sources
Author:
Affiliation:
1. Laser Plasma Laboratory, Townes Laser Institute, The College of Optics and Photonics, University of Central Florida, Orlando, Florida 32816, USA
2. The College of Physics, Florida Polytechnic University, Lakeland, Florida 33805, USA
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4986782
Reference47 articles.
1. Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics
2. Extreme ultraviolet lithography: A review
3. Performance results of laser-produced plasma test and prototype light sources for EUV lithography
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2. Radiation of extreme ultraviolet source and out-of-band from laser-irradiated low-density SnO<sub>2</sub> target;Acta Physica Sinica;2023
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