Direct imprinting of dielectric materials for dual damascene processing-Reference-Cited by-同舟云学术

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Direct imprinting of dielectric materials for dual damascene processing

Published:2005-05-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Stewart Michael D.,Wetzel Jeffery T.,Schmid Gerard M.,Palmieri Frank,Thompson Ecron,Kim Eui Kyoon,Wang David,Sotodeh Ken,Jen Kane,Johnson Stephen C.,Hao Jianjun,Dickey Michael D.,Nishimura Yukio,Laine Richard M.,Resnick Douglas J.,Willson C. G.

Publisher

SPIE

Cited by 33 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoimprint lithography: 2D or not 2D? A review;Applied Physics A;2015-04-01

2. CMOS compatible fabrication of 3D photonic crystals by nanoimprint lithography;SPIE Proceedings;2015-03-25

3. Nanoimprint lithography and micro-embossing in LiGA technology: similarities and differences;Microsystem Technologies;2013-09-22

4. Ultraviolet curable branched siloxanes as low-k dielectrics for imprint lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2013-01

5. Single-step 3D nanolithography using plasma polymerized hexane films;Microelectronic Engineering;2012-10

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