Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference27 articles.
1. Ahn SH, Guo LJ (2009) Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting. ACS Nano 3(8):2304–2310
2. Ahn S-W, Lee K-D, Kim J-S, Kim SH, Park J-D, Lee S-H, Yoon P-W (2005) Fabrication of a 50 nm half-pitch wire grid polarizer using nanoimprint lithography. Nanotechnology 16:1874–1877
3. Becker EW, Ehrfeld W, Hagmann P, Maner A, Münchmeyer D (1986) Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process). Microelectron Eng 4(1):35–56
4. Both A, Bacher W, Heckele M, Müller KD (1995) Herstellung beweglicher LIGA-Mikrostrukturen durch positionierte Abformung, Technical Report, FZKA 5671, Germany
5. Chou SY, Krauss PR (1997) Imprint lithography with sub-10 nm feature size and high throughput. Microelectron Eng 35:237–240
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