Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography-Reference-Cited by-同舟云学术

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Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography

Published:2000-07-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Enami Tatsuo,Wakabayashi Osamu,Ishii Ken,Terashima Katsutomo,Itakura Yasuo,Watanabe Takayuki,Ohta Takeshi,Ohbu Ayako,Kubo Hirokazu,Tanaka Hirokazu,Suzuki Toru,Sumitani Akira,Mizoguchi Hakaru

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Excimer Lasers for Lithography and Annealing;Handbook of Laser Micro- and Nano-Engineering;2021

2. Excimer Lasers for Lithography and Annealing;Handbook of Laser Micro- and Nano-Engineering;2021

3. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation;SPIE Proceedings;2003-06-25

4. Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography;SPIE Proceedings;2001-09-14

5. Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography;SPIE Proceedings;2001-09-14

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