Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography-Reference-Cited by-同舟云学术

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Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography

Published:2001-09-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Saito Takashi,Matsunaga Takashi,Mitsuhashi Ken-ichi,Terashima Katsutomo,Ohta Takeshi,Tada Akifumi,Ishihara Takanobu,Yoshino Masaya,Tsushima Hiroaki,Enami Tatsuo,Tomaru Hitoshi,Igarashi Tatsushi

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source;Optics Express;2018-08-13

2. Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm;Optics Express;2018-01-09

3. A design of energy detector for ArF excimer lasers;UV and Higher Energy Photonics: From Materials to Applications 2017;2017-08-29

4. Micro-optics: enabling technology for illumination shaping in optical lithography;SPIE Proceedings;2014-03-31

5. Fabrication antireflection (AR) coatings for P-polarized 193nm laser light at an incidence angle of 74°;Optics Communications;2013-07

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