A design of energy detector for ArF excimer lasers-Reference-Cited by-同舟云学术

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A design of energy detector for ArF excimer lasers

Published:2017-08-29 Issue: Volume: Page:
ISSN:
Container-title:UV and Higher Energy Photonics: From Materials to Applications 2017
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Author:

Han Xiaoquan,Zhou Yi,Bai Lujun,Feng Zebin

Publisher

SPIE

Reference18 articles.

1. Deveriopment on excimer laser lithography;Wenyan;LASER JOURNAL.,1992

2. Ultra-narrow bandwidth 4kHz ArF excimer laser for 193nm lithography;SAITO,2001

3. Reliable high power injection locked 6kHz 60W laser for ArF immersion lithography;KUMAZAKI,2008

4. High-repetition-rate (6kHz) and long-pulse-duration (50ns) ArF excimer laser for sub-65nm lithography

5. Study on energy control algorithm for high-repetition-rate ArF excimer lasers;Xiao-shun;LASER TECHNOLOGY.,2012

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