Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation-Reference-Cited by-同舟云学术

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Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Published:2003-06-25 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Saito Takashi,Suzuki Toru,Yoshino Masaya,Wakabayashi Osamu,Matsunaga Takashi,Fujimoto Junichi,Kakizaki Kouji,Yamazaki Taku,Inoue Toyoharu,Terashima Katsutomo,Enami Tatsuo,Inoue Hirotoshi,Sumitani Akira,Tomaru Hitoshi,Mizoguchi Hakaru

Publisher

SPIE

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extremely long life excimer laser chamber technology for multi-patterning lithography;Optical Microlithography XXXII;2019-03-27

2. Longitudinally excited N2 laser with large-diameter discharge tube;Review of Scientific Instruments;2017-04

3. Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography;SPIE Proceedings;2014-04-04

4. Note: Measurement for the disturbance of discharge medium in pulsed gas laser;Review of Scientific Instruments;2013-08

5. High-pulse-repetition-rate UV lasers with the inductance-capacitance discharge stabilisation;Quantum Electronics;2009-02-28

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