Longitudinally excited N2 laser with large-diameter discharge tube
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4979805
Reference10 articles.
1. High-repetition-rate (6kHz) and long-pulse-duration (50ns) ArF excimer laser for sub-65nm lithography
2. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation
3. High-power injection lock laser platform for ArF dry/wet lithography
4. Oscillation and gain characteristics of longitudinally excited VUV F2 laser at 40 Torr total pressure
5. XeF excimer laser pumped in a longitudinal low‐pressure discharge
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1. MW peak-power UV inductive nitrogen laser;Applied Physics B;2020-05-20
2. Simple and Compact Longitudinally Excited CO2 Laser Driven with A Fast High-Voltage Solid-State Switch;Journal of Laser Micro/Nanoengineering;2019-09
3. Efficient N2 laser pumped by nanosecond diffuse discharge;Optics Communications;2019-01
4. Experimental and theoretical investigations for describing pressure dependence of amplified spontaneous emission output energy, small signal gain and electrical conductivity in nitrogen lasers;Optik;2018-09
5. Development of longitudinally excited CO2 laser;Journal of Physics: Conference Series;2018-05
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