Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography-Reference-Cited by-同舟云学术

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Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Published:2014-04-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Tsushima Hiroaki,Katsuumi Hisakazu,Ikeda Hiroyuki,Asayama Takeshi,Kumazaki Takahito,Kurosu Akihiko,Ohta Takeshi,Kakizaki Kouji,Matsunaga Takashi,Mizoguchi Hakaru

Publisher

SPIE

Reference2 articles.

1. Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography;Saito,2003

2. Reliable High Power Injection Locked 6kHz 60W Laser for ArF Immersion Lithography;Watanabe,2007

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