All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning-Reference-Cited by-同舟云学术

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All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning

Published:2020-03-26 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXVII
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Author:

Sharma Satinder,Kumar Rudra,Chauhan Manvendra,Moinuddin Mohamad G.,Peter Jerome,Ghosh Subrata,Pradeep Chullikkattil P.,Gonsalves Kenneth E.

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multi-Trigger Resist for EUV lithography;Journal of Photopolymer Science and Technology;2023-06-15

2. EUV lithography patterning using multi-trigger resist;Advances in Patterning Materials and Processes XL;2023-05-01

3. A novel stable zinc–oxo cluster for advanced lithography patterning;Journal of Materials Chemistry A;2023

4. Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-12-27

5. Recent accomplishments in EUV lithography patterning for multi-trigger resist;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

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