A novel stable zinc–oxo cluster for advanced lithography patterning-Reference-Cited by-同舟云学术

A novel stable zinc–oxo cluster for advanced lithography patterning

Published:2023 Issue:9 Volume:11 Page:4801-4807
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Si Youming¹,Zhao Yingdong¹,Shi Guangyue²,Zhou Danhong¹,Luo Feng²,Chen Pengzhong¹³^ORCID,Fan Jiangli¹⁴^ORCID,Peng Xiaojun¹⁴^ORCID

Affiliation:

1. State Key Laboratory of Fine Chemicals, Frontiers Science Center for Smart Materials Oriented Chemical Engineering, School of Chemical Engineering, Dalian University of Technology, Dalian 116024, China

2. School of Materials Science and Engineering, Nankai University, Tianjin 300350, China

3. Ningbo Institute of Dalian University of Technology, Ningbo 315016, China

4. Research Institute of Dalian University of Technology in Shenzhen, Shenzhen 518057, China

Abstract

Single crystal X-ray diffraction analysis showed a Zn–VBA with a size of 2.2 nm, in line with advanced lithography technology requirements. The introduction of benzoic acid ligands resulted in high thermal stability, good solubility, and good film-forming capability.

Funder

National Natural Science Foundation of China

National Key Research and Development Program of China

Key Technology Research and Development Program of Shandong

Fundamental Research Funds for the Central Universities

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/TA/D3TA00115F

Reference48 articles.