EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems-Reference-Cited by-同舟云学术

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EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems

Published:2018-10-03 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2018
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Author:

Sah Kaushik,Cross Andrew,Plihal Martin,Anantha Vidyasagar,Babulnath Raghav,De Bisschop Peter,Halder Sandip,Fung Derek

Publisher

SPIE

Reference5 articles.

1. EUV Reticle Print Verification with Advanced Broadband Optical Wafer Inspection and e-Beam Review Systems;Sanapala,2017

2. Stochastic effects in EUV Lithography;De Bisschop,2018

3. Connected component analysis of review SEM images for sub-10 nm node process verification;Halder,2017

4. Stochastic effects in EUV lithography: random, local CD variability, and printing failures;De Bisschop;JM3,2017

5. Stochastic printing failures is EUV lithography;De Bisschop;JM3,2018

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