Wafer Eccentricity Deviation Measurement Method Based on Line-Scanning Chromatic Confocal 3D Profiler
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Published:2023-04-03
Issue:4
Volume:10
Page:398
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ISSN:2304-6732
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Container-title:Photonics
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language:en
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Short-container-title:Photonics
Author:
Qu Dingjun123ORCID, Zhou Zuoda123, Li Zhiwei13, Ding Ruizhe123, Jin Wei13, Luo Haiyan123, Xiong Wei123
Affiliation:
1. Anhui Institute of Optics and Fine Mechanics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031, China 2. Science Island Branch, Graduate School of University of Science and Technology of China, Hefei 230026, China 3. Key Laboratory of Optical Calibration and Characterization of Chinese Academy of Sciences, Hefei 230031, China
Abstract
The wafer eccentricity deviation caused by misalignment between the center of the wafer and rotary table will lead to edge image distortion and quality degradation of the defect signals during automated inspection. However, wafer end jump and edge topography change will bring great challenges to the accurate measurement of micrometer deviations. A new wafer eccentricity deviation measurement method based on line-scanning chromatic confocal sensors (LSCCSs) is proposed. Firstly, the LSCCS with Z-axis submicron resolution used in the experiment acquires the 3D profile height of the wafer edge as the turntable rotates, and the edge distance is calculated at each rotation angle. Secondly, a robust Fourier-LAR fitting method is used to fit edge distance serial to reduce sensitivity to outliers. Finally, the wafer eccentricity deviation that is equal to the wafer center coordinate can be calculated using the wafer eccentricity deviation model. In the simulated experiment, the results show that the eccentricity deviation measurement accuracy was insensitivity to noise and reached the micron level. Additionally, the measurement uncertainty of eccentricity deviation coordinate Xw,Yw was (0.53 µm, 1.4 µm) in the actual data of the 12-inch wafers.
Funder
National Natural Science Foundation of China Chinese Academy of Sciences HFIPS Director’s Fund
Subject
Radiology, Nuclear Medicine and imaging,Instrumentation,Atomic and Molecular Physics, and Optics
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