1. Accurate and Repeatable Mask Defect Measurement for. 25 Micron Technology;Fiekowsky,1997
2. Specifying and Measuring Photomask Critical Dimensions;Mack;The Lithography Expert,1999
3. WLCD: A new System for Wafer Level CD Metrology on Photomasks;Martin,2009
4. Automated mask and wafer defect classification using a novel method for generalized CD variation measurements;Verechagin,2018
5. Determining a critical dimension variation of a pattern;Verechagin,2018