1. EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems;Sah,2018
2. Inspection of stochastic defects with broadband plasma optical systems for extreme ultraviolet (EUV) lithography;Sah;IEEE Trans. Semicond. Manuf.,2020
3. Inspection challenges for triple patterning at sub-14 nm nodes with broadband plasma inspection platforms;Halder,2015
4. Laser-Driven Light Source;Smith,2008
5. A novel high-brightness broadband light-source technology from the VUV to the IR;Horne,2010