1. EUV industrialization high volume manufacturing with NXE3400B;Mastenbroek,2018
2. Actinic Review of EUV masks: Challenges and achievements in delivering the perfect mask for EUV production;Hellweg,2017
3. Aerial image based metrology of EUV masks: recent achievements, status and outlook for the AIMSTM EUV platform;Capelli,2018
4. Printability and actinic AIMS review of programmed mask blank defects;Verduijn,2017
5. Experimental Investigation of a high-k reticle absorber system for EUV lithography;Finders,2019