Characterization of the polymer-developer interface in 193-nm photoresist polymers and formulations during dissolution
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SPIE
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fundamental study on dissolution behavior of poly(methyl methacrylate) by quartz crystal microbalance;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18
2. Effects of low-molecular weight resist components on dissolution behavior of chemically amplified resists for extreme ultraviolet lithography studied by quartz crystal microbalance;SPIE Proceedings;2015-03-19
3. Study on Dissolution Behavior of Poly(4-hydroxystyrene) as Model Polymer of Chemically Amplified Resists for Extreme Ultraviolet Lithography;Journal of Photopolymer Science and Technology;2015
4. Study on dissolution behavior of polymer-bound and polymer-blended photo acid generator (PAG) resists by using quartz crystal microbalance (QCM) method;Microelectronic Engineering;2014-11
5. Study of swelling behavior in ArF resist during development by the QCM method (3): observations of swelling layer elastic modulus;SPIE Proceedings;2013-03-29
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