Author:
Mitsuyasu Masaki,Yamamoto Hiroki,Kozawa Takahiro
Reference19 articles.
1. Tagawa S., S. Nagahara, T. Iwamoto, M. Wakita, T. Kozawa, Y. Yamamoto, D. Werst, and Trifunac A. D., Proc. SPIE 3999 204 (2000).
2. Radiation-Induced Acid Generation Reactions in Chemically Amplified Resists for Electron Beam and X-Ray Lithography
3. Advancements in EUV Resist Materials and Processing
4. A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson and P. Blackborow, Proc. SPIE 6519 651946–1 (1996).
5. M. Toukhy, K. Schlicht, B. Maxwell and S. Chanthalyma Proc. SPIE 3999, 638 (2000).