Lithographic stochastics: beyond 3σ

Author:

Bristol Robert L.1,Krysak Marie E.1

Affiliation:

1. Intel Corporation, Components Research, Hillsboro, Oregon, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Complementary lithography–broad brush approach;Borodovsky,2002

2. Lithography tool requirements;Phillips,2013

3. Introduction to statistics;Lane,2013

4. Simulation study of the influence of PEB reaction rates on resist LER

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