Author:
Progler Christopher J.,Bukofsky Scott J.,Wheeler Donald C.
Cited by
16 articles.
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1. Review of scanning electron microscope-based overlay measurement beyond 3-nm node device;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-06-13
2. Overlay error statistics for multiple-exposure patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-04-04
3. Lithographic imaging-driven pattern edge placement errors at the 10-nm node;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-30
4. High-order distortion control using a computational prediction method for device overlay;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-03-29
5. Image placement error: closing the gap between overlay and imaging;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-07-01