High-power sources for EUV lithography: state of the art-Reference-Cited by-同舟云学术

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High-power sources for EUV lithography: state of the art

Published:2004-09-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:High-Power Laser Ablation V
language:
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Author:

Stamm Uwe,Kleinschmidt Juergen,Gaebel Kai M.,Birner Henry,Ahmad Imtiaz,Bolshukhin Denis,Brudermann Jesko,Chinh Tran Duc,Flohrer Frank,Goetze Sven,Hergenhan Guido,Kloepfel Diethard,Korobochko Vladimir,Mader Bjoern,Mueller Rainer,Ringling Jens,Schriever Guido,Ziener Christian

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography;Optics Express;2015-02-12

2. Effectiveness of Mo–Au Gibbsian segregating alloys and the surface removal effect on the Gibbsian segregating performance for extreme ultraviolet collector optics;Optical Engineering;2009-05-01

3. Design for Pre/main Pulsed Power Generator for EUVL Source;2008 International Conference on High Voltage Engineering and Application;2008-11

4. Time exposure performance of Mo-Au Gibbsian segregating alloys for extreme ultraviolet collector optics;Applied Optics;2008-04-28

5. Extreme ultraviolet lithography: From research to manufacturing;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2007

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